Analysis of Residual Stresses in Evaporated and Plating Films
スポンサーリンク
概要
- 論文の詳細を見る
This paper is concerned with a theoretical evaluation of residual stresses in multilayered structures fabricated on substrates, such as evaporated films and plating films. Firstly, the analysis of thermal stresses in multilayered elastic thin films is carried out by using the method of strain suppression. Next, the theoretical formulas for evaluation of residual stresses arising in thin films and substrates are derived by combining the results of the thermal stress analysis and those of stresses due to the inherent strains of the thin film. Furthermore the controlling parameters of residual stresses are derived theoretically. Experimental results of residual stresses in evaporated Ag films and hard chrominum plating films agree approximately with theoretical ones.
- 社団法人溶接学会の論文
- 1991-04-01
著者
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Mitani Hideki
Anan College Of Technology
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Toyoda Msaao
Osaka University
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TOYODA Masao
Osaka University
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Hirano Toshio
Department Of Mechanical Engineering Takamatsu National College Of Technology
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Hirano Toshio
Takamatsu National College Of Technology
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Suita Yoshikazu
Department Of Mechanical Engineering Takamatsu National College Of Technology
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Suita Yoshikazu
Takamatsu National College Of Technology
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Tanaka Masahumi
Department Of Mechanical Engineering Takamatsu National College Of Technology
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KUSANAGI Kazumasa
Toyo Opto Device Co., Ltd.
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NAKAMURA Sigeaki
Takamatsu National College of Technology
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YAMAMOTO Yoshihiro
Takamatsu National College of Technology
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Tanaka Masabumi
Department Of Mechanical Engineering Takamatsu National College Of Technology
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Kusanagi Kazumasa
Toyo Opto Device Co. Ltd.
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