Modeling of Interconnect Line Using ADI-FDTD Method
スポンサーリンク
概要
- 論文の詳細を見る
As the chip density becomes high, the structure of interconnect lines become more complex. We report the finite difference time domain (FDTD) method for solving the full-wave Maxwell's equations. In order to resolve the limitation of Courant-Friedrich-Levy (CFL) stability condition, we employed an alternating-direction-implicit (ADI) time-stepping scheme. We developed a numerical analysis model by using ADI-FDTD method to analyze three-dimensional interconnect structure. Numerical simulations using the ADI-FDTD method has been presented for solving the electromagnetic phenomena of interconnect line. After modeling the interconnect line with the three-dimensional grid structure, the transient response of the field distribution is depicted in the time domain.
- 一般社団法人電子情報通信学会の論文
- 2002-06-24
著者
-
Won Taeyoung
School Of Electrical Engineering National It Research Center For Computational Electronics Inha Univ
-
Choi Ikjoon
School of Electronics and Electrical Engineering, Inha University
関連論文
- An Effective Extraction of Distributed RLC Circuit Model for Multi-level Interconnects by Layout-Fracturing Algorithm
- An Effective Extraction of Distributed RLC Circuit Model for Multi-level Interconnects by Layout-Fracturing Algorithm
- Kinetic Monte Carlo (KMC) Modeling for Boron Diffusion in Strained Silicon
- An Advancing Front Meshing Algorithm Using NURBS for Semiconductor Process Simulation (Special lssue on SISPAD'99)
- An Accurate Two-dimensional Semiconductor Device Analysis using Finite-Element Method
- An Accurate Two-dimensional Semiconductor Device Analysis using Finite-Element Method
- Study on the Crosstalks at Interconnects of Integrated Circuits by FDTD-PML
- Study on the Crosstalks at Interconnects of Integrated Circuits by FDTD-PML
- Modeling of Interconnect Line Using ADI-FDTD Method