Red Shift due to the Cross-link and Blue Shift due to the Bond-break in Organic Materials(Session A1 Si Novel Device and Process)(2004 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))

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概要

• 論文の詳細を見る

• Fluorinated amorphous carbon films are organic type materials with low dielectric constant. lt is known that the origin of low dielectric constant causes the cross-link bonding structure of this film. The blue shift of the fluorinated amorphous carbon films is due to the C-C bond-break by high energy at the transition state. 0n the other hand, the red shift causes the low energy at the transition state during the deposition. The origin of the chemical shifts is peculiar interaction of the C-H bond elongation according to the neighboring condition. The red shift of the cross-link structure contains the surface effect of a weak boundary condition due to low energy distribution. Therefore, the flatness of the films also improves.

• 社団法人電子情報通信学会の論文
• 2004-06-23

著者

• Kim Kyungsik

  Research Institute Of Advanced Technology Faculty Of Electrical And Electronic Engineering Cheju Nat

• OH Teresa

  Research Institute of Advanced Technology, Cheju National University

• LEE Kwangman

  Research Institute of Advanced Technology, Faculty of Electrical and Electronic Engineering, Cheju N

• CHOI Chikyu

  Dept. of Physics, Cheju National University

• Oh T

  Research Institute Of Advanced Technology Cheju National University

• Oh Teresa

  Research Institute Of Advanced Technology Cheju National University

• Choi Chikyu

  Dept. Of Physics Cheju National University

• Lee Kwangman

  Research Institute Of Advanced Technology Faculty Of Electrical And Electronic Engineering Cheju Nat

関連論文

• Chemical Shift Determined According to Flow Rate Ratio O_2/BTMSM by Fourier Transform Infrared Spectra and X-ray Photoelectron Spectroscopy
• Red Shift due to the Cross-link and Blue Shift due to the Bond-break in Organic Materials(Session A1 Si Novel Device and Process)(2004 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))
• Red Shift due to the Cross-link and Blue Shift due to the Bond-break in Organic Materials(Session A1 Si Novel Device and Process)(2004 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))
• Redshift and Blueshift Due to Interaction between C-H Bond of Methyl Radicals and Highly Electronegative Oxygen
• Porosity of Organosilicate Films in a Range of Organic Properties
• Generation of SiOC films by the Thermal Induction
• Chemical Shift Determined According to Flow Rate Ratio O2/BTMSM by Fourier Transform Infrared Spectra and X-ray Photoelectron Spectroscopy
• Porosity of Organosilicate Films in a Range of Organic Properties

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