Chemical Shift Determined According to Flow Rate Ratio O2/BTMSM by Fourier Transform Infrared Spectra and X-ray Photoelectron Spectroscopy

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概要

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• Organic-inorganic hybrid silica materials grown on an interlayer low dielectric material have been studied. Organic-inorganic hybrid silica materials have a low dielectric constant due to the presence C and H atoms which are lighter than Si and O. In this study, it was confirmed the chemical shift clarified by Fourier Transform Infrared spectroscopy and X-ray photoelectron spectroscopy (XPS) that the characteristics of the organosilicate films are attributable to the cross-link with low electronic polarizability and the cross-link breakdown structure with pores. The fourier transform infrared (FTIR) spectra from the peak at 3450 cm-1 to the peak at 3600 cm-1 are formed by the OH bond of R–OH$\cdots$O–C type, and the band from the peak at 3580 cm-1 to the peak at 3670 cm-1 is formed by the C–H$\cdots$O hydrogen bond of R–O=C type. Among organosilicate films as organic inorganic hybrid silica materials, those films with the electron-widthdrawing group consist of the bond structure of organometallic carbon, and those with the electron-releasing group consist of the bond structure of organic carbon, and this was confirmed by XPS.

• 2003-10-15

著者

• Oh Teresa

  Research Institute Of Advanced Technology Cheju National University

• Oh Sung-bo

  Faculty Of Electrical And Electronic Engineering Cheju National University

• Won Mi-sook

  Korea Basic Science Institute Busan Branch

• Kim Heung-soo

  Faculty Of Telecomunication And Computer Engineering Cheju National University

• Oh Sung-Bo

  Faculty of Electrical and Electronic Engineering, Cheju National University, Jeju 690-756, Korea

• Kim Heung-Soo

  Faculty of Telecomunication and Computer Engineering, Cheju National University, Jeju 690-756, Korea

• Won Mi-Sook

  Korea Basic Science Institute, Busan Branch, Busan 609-735, Korea

関連論文

• Chemical Shift Determined According to Flow Rate Ratio O_2/BTMSM by Fourier Transform Infrared Spectra and X-ray Photoelectron Spectroscopy
• Red Shift due to the Cross-link and Blue Shift due to the Bond-break in Organic Materials(Session A1 Si Novel Device and Process)(2004 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))
• Red Shift due to the Cross-link and Blue Shift due to the Bond-break in Organic Materials(Session A1 Si Novel Device and Process)(2004 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))
• Redshift and Blueshift Due to Interaction between C-H Bond of Methyl Radicals and Highly Electronegative Oxygen
• Generation of SiOC films by the Thermal Induction
• Chemical Shift Determined According to Flow Rate Ratio O2/BTMSM by Fourier Transform Infrared Spectra and X-ray Photoelectron Spectroscopy
• Porosity of Organosilicate Films in a Range of Organic Properties

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