Influence of Film Characteristics on the Sputtering Rate of MgO (Special Issue on Electronic Displays)
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概要
- 論文の詳細を見る
We investigated the relationship between the film characteristics and the sputtering rate of the MgO protecting layer in AC-PDP. As possible elements for determining the sputtering rate, we considered the density, orientation, and surface morphology. With respect to the orientation, we found that the sputtering rate increased for the sequence of (200) < (220) < (111). However, we noticed that orientation and surface structure are not really decisive factors affecting the sputtering rate; the density of the film is most important.
- 社団法人電子情報通信学会の論文
- 1999-10-25
著者
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BETSUI Keiichi
Fujitsu Limited
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Inoue H
Faculty Of Engineering And Resource Science Akita University
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Betsui K
Fujitsu Laboratories Ltd.
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INOUE Hiroshi
FUJITSU LABORATORIES LTD.
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HIDAKA Souichirou
Fujitsu Laboratories Limited
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ISHIMOTO Manabu
Fujitsu Laboratories Limited
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IWASE Nobuhiro
Fujitsu Laboratories Limited
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Ishimoto Manabu
Laboratory For Atomic And Surface Physics Engineering Physics University Of Virginia:fujitsu Laborat
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