Measuring the thickness and thickness uniformity of ultra-thin AlO_x films in magnetic tunneling junctions by combined RBS and conducting atomic force microscopy
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概要
- 論文の詳細を見る
In this article, we present a study to measure average thickness and as well as the thickness uniformity of the ultra-thin AlO_x barrier layer by combined RBS and conducting atomic force microscopy(C-AFM). RBS in tilted angle geometry was used to determine the average thickness on a macroscopic scale. By carefully analyzing the variation of energy width of Al spectra with tilt angle, the average thickness of AlO_x layers has been quantitatively determined. The thickness and thickness uniformity on a microscopic scale was measured by C-AFM. The errors of both techniques will also be discussed.
- 社団法人電子情報通信学会の論文
- 2001-11-01
著者
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Wong C
Materials Characterization And Preparation Facility Hong Kong University Of Science And Technology
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Wong S.k.
Materials Characterization And Preparation Facility Hong Kong University Of Science And Technology
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Wong C.y.
Materials Characterization And Preparation Facility Hong Kong University Of Science And Technology
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Xu J.b.
Department Of Electronic Engineering The Chinese University Of Hong Kong
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Wilson I.h.
Department Of Electronic Engineering The Chinese University Of Hong Kong
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Pakhomov A
Materials Characterisation And Preparation Facility Hong Kong University Of Science And Technology
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Luo E.Z.
Department of Electronic Engineering, The Chinese University of Hong Kong
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Pakhomov A.B.
Materials Characterizatino and Preparation Facility Hong Kong University of Science and technology,
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Sundaravel B.
Department of Electronic Engineering, The Chinese University of Hong Kong
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Luo E.z.
Department Of Electronic Engineering The Chinese University Of Hong Kong
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Sundaravel B.
Department Of Electronic Engineering The Chinese University Of Hong Kong
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Sundaravel B.
Materials Characterizatino and Preparation Facility Hong Kong University of Science and technology, Clear Water Bay
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Xu J.B.
Materials Characterizatino and Preparation Facility Hong Kong University of Science and technology, Clear Water Bay
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