607 Influence of O_2 Gas Partial Pressure and Substrate Temperature on Wear Resistance of Al_2O_3 films deposited by Radio-Frequency Magnetron Sputtering

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Al_2O_3 film is being increasingly considered in various tribological applications in recent years, since it has superior mechanical and physical properties such as high thermal and chemical stability and high hardness. However high wear resistance of required to the films for use under severe conditions. The wear resistance of the films depends strongly on their intrinsic hardness, the bond strength to the underlying substrate, internal stress, composition and microstructure. The purpose of the present study is to clarify the relationship between these characteristics of the films and the sputtering conditions. The film hardness measured by nanoindentation increase with increasing substrate temperature and decreases with increasing O_2 partial pressure. The wear resistance of the films investigated using a pin-on-disk sliding tester increases with increasing substrate temperature, but is independent of O_2 partial pressure. X-ray diffraction measurements indicate that the crystal structure of the films is amorphous at all O_2 partial pressures and substrate temperatures.
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