D312 FT-ICR STUDY OF CHEMICAL REACTION OF SILICON CLUSTER WITH NITRIC OXIDE(Micro-scale phenomena)

概要

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Chemical reaction of small silicon cluster ions (Si_n^+: 20 ≤ n ≤ 29) with nitric oxide was studied by using the FT-ICR (Fourier Transform Ion Cyclotron Resonance) mass spectrometer. Silicon clusters were generated by a pulsed laser-vaporization supersonic-expansion cluster beam source directly connected to the FT-ICR mass spectrometer. Injected and size selected clusters were thermalized to the room temperature through collisions with argon, and were exposed to the reactant gas in the ICR cell. As a result, extraction reaction of a silicon atom was observed. When SiO was removed from Si_n^+ cluster, resulting Si_<n-1>N^+ clusters occasionally fragmented into smaller pieces. For a comparison, laser induced fragmentation patterns of size-selected clusters were performed. The reaction induced fragmentation was explained that after the Si atom extraction, resulting Si_<n-1>N^+ fragmented in the same manner as pure Si_ <n-1>N^+ clusters when the released heat of the initial reaction was not absorbed in the Si_<n-1>N^+ clusters.
社団法人日本機械学会の論文
2000-10-01