Liquid Film Formation on a Rotating Disk (Numerical Analysis at the Initial Stage)
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概要
- 論文の詳細を見る
Unsteady liquid film flow on a rotating disk which is related to a spin coating technique to form a uniform thin film on a plate is calculated numerically. A newly developed calculation method which takes the surface tension on the liquid surface into account is applied. The numerical results reveal the following : the hemispherical liquid on the disk, which starts to rotate impulsively from rest, spreads by gravitational forces at the first stage. The development of the distribution of radial and azimuthal velocities is affected complicatedly by the Coriolis forces, viscous forces and centrifugal forces. The liquid spreads mainly by centrifugal forces and forms a uniform thin film on the disk at the last stage. The surface tension only show a little influence on the spreading process at the first stage.
- 一般社団法人日本機械学会の論文
- 1989-02-15
著者
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Matsumoto Yoichiro
Department Of Mechanical Engineering The University Of Tokyo
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Matsumoto Yoichiro
Department Of Mechanical Engineering University Of Tokyo
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Ohashi Hideo
Department Of Applied Biological Science Faculty Of Applied Biological Sciences Gifu University
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OHARA Taku
Department of Mechanical Engineering, University of Tokyo
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TERUYA Isao
Faculty of Engineering, University of Ryukyu
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Teruya Isao
Faculty Of Engineering University Of Ryukyu
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Ohashi Hideo
Department Of Mechanical Engineering University Of Tokyo
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Matsumoto Yoichiro
Department of Bioengineering, Graduate School of Engineering, The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
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