B26-057 APPLICATION OF MOLECULAR-DYNAMICS SIMULATION TO INTERFACE STABILIZATION IN THIN-FILM DEVICES
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概要
- 論文の詳細を見る
We have developed a molecular-dynamics technique for simulating interface diffusion, which is one of the dominant factors in mechanical failures of thin-film devices. This technique was used to find effective methods for suppressing the interface diffusion and for stabilizing interfaces. Barreier-underlayer materials effective for improving the adhesion strength with Cuinterconnect films were found by using this technique. The crystal orientation of Si substrates effective for reducing atomic diffusion at interfaces between the Si substrates and high-k dielectrics (ZrO_2 and HfO_2) was determined.
- 社団法人日本機械学会の論文
- 2003-11-30
著者
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Iwasaki Tomio
Mechanical Engineering Res. Lab. Hitachi Ltd.
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Iwasaki Tomio
Mechanical Engineering Research Laboratory Hitachi Ltd.
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