ウッドセラミックスから高周波マグネトロンスパッタリングで作製した炭素膜の機械的及び電気的特性

概要

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New carbon thin films were prepared using radio frequency magnetron sputtering of a woodceramic disk in argon plasma and their mechanical and electrical properties were measured. A film series was deposited varying the substrate temperature between 50 and 500℃. The film's mechanical and electrical properties depended on the substrate temperature. Films deposited at 50℃ had a density of 1.9-2.2 g/cm^3, comparable to that of typical diamond-like carbon films, but the Vickers hardness of the film experienced a value as low as ≈1/50. Adhesion was between 120 and 200 MPa for substrate temperatures below 300℃ and decreases rapidly for temperatures higher than 400℃. Films deposited below 300℃ were insulative, i.e., p<10^>10> Ω・cm. For deposition below 100℃, the films showed good frequency characteristics terms of both relative permittivity and loss coefficient, which were almost constant over the range between 1 kHz and 5 MHz.
社団法人日本セラミックス協会の論文
2000-01-01