シリコンオキサイドで被覆された研磨窒化アルミニウム基板

元データ 1997-02-01

概要

Polished aluminium nitride substrates have imperfections of surface roughness in the form of cavities due to the loss of grains. Measurements using the Image Processing System and the Dimensional Measurement method, revealed that cavities with diameters larger than 10 μm existed in quantities of about 22.5 × 10^5 pieces on a substrate of 152 mm^2 and that their depths were about 1.3 μm. The cavities also had sharp edges and steep cliffs. The application of a thin coating of silicon oxide was studied for obtaining a smoother surface of the polished aluminium nitride substrate. The depth of the coated cavity decreased with increasing thickness of the film, and the shape of the cavities, especially their sharp edge and steep cliff could not be seen clearly as the thickness of the film increased. However, even if the film thickness was as great as 1.2 μm, cavities of about 0.21 μm depth remained on the coated substrate. A 10 μm comb electric pattern could be made on the surface of the substrate coated with 0.5 μm of film. All patterns exhibited 1856 blocks (a block has 29 lines) and were uniform without any broken portions.

著者

永井 裕二 東洋アルミニウム(株)研究開発本部研究所
中川 信政 東洋アルミニウム(株)研究開発本部研究所

関連論文