熱プラズマ高速 CVD 法によるダイヤモンド薄膜合成

概要

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Using a radio-frequency (rf) thermal plasma torch with a water cooled nozzle, the diamond film was synthesized at the maximum rate of 880μm/h on a molybdenum substrate from CH4 and H2 at a torch pressure of 517 Torr. The deposition rate was studied as a function of following parameters: diameter of the nozzle (6 to 24mm), diameter of the plasma torch (50 and 60mm), plate power (44 to 81kW), torch pressure (740 to 400 Torr), and CH4/H2 feed ratio (4 to 5%). The deposition rate increased with decreasing the nozzle diameter from 24 to 8mm but decreased at 6mm. The columnar-like films were obtained after one hour deposition with the nozzles of 12, 10, and 8mm in diameter.
社団法人日本セラミックス協会の論文
1991-02-01