Surface Field Effect and Noise in Ge Grain Boundary

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概要

• 論文の詳細を見る
• 社団法人日本物理学会の論文
• 1961-09-05

著者

• Kotani Ken

  College Of Engineering Osaka University

• Tsurumi Ichiro

  College Of Engineering Osaka University

• INUISHI Yoshio

  College of Engineering, Osaka University

• Inuishi Yoshio

  College Of Engineering Osaka University

関連論文

• Al Redistribution in Thermally Oxidized Si Surface
• Optical Absorption of Thermally Oxidized Si Oxide Film
• N Type Conversion of Thermally Oxidized Si Surface
• Slow Decay of Reverse Current and Noise in Field Effect on Ge P^+-N Junction
• Surface Field Effect and Noise in Ge Grain Boundary
• 1/f Noise and Channel in Ge PN Junction
• Drift Mobility of Photo-Injected Electrons in Hexane-Silicone Mixture
• Effect of Thickness on Photoconduction of Colored KCl
• Effects of Vacancies on Pulse Photoconductions in CdS Single Crystals

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