The Resistance Maximum in Copper Manganese Dilute Alloys
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概要
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Electrical resistivity was measured in copper manganese alloy system with manganese concentration between 0.06 and 5.2 atomic percent in the temperature range from 2 to 300°K. The residual resistivity separated from the observed resistivity, has a maximum at certain temperature which is proportional to the concentration. The maximum arises from a combined effect of the Kondo log T term and the term caused by the effective molecular field due to spin ordering. In the sample with the concentration higher than 1 atomic percent the tail of the Kondo log T term was very large even at a temperature as high as 300°K. This fact enables us to explain the maximum in the concentrated sample.
- 社団法人日本物理学会の論文
- 1969-08-05
著者
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Kinoshita Nobumori
Physics Division Electrotechnical Laboratory
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NAKAMURA Akira
Physics Section, Electrotechnical Laboratory
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Nakamura Akira
Physics Division Electrotechnical Laboratory
関連論文
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- The Resistance Maximum in Copper Manganese Dilute Alloys
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