Multiple-Ionization Effect on Charge-State Distribution in ECR Source

スポンサーリンク

概要

• 論文の詳細を見る

• Fundamental processes of the ECR (electron cyclotron resonance) multiply charged ion source have been experimentally studied with a two-stage mirror field configuration. A model based on cumulative ionization processes has been proposed to investigate charge-state distributions (C. S. D. ) of argon ions. Experimental results and simulations have suggested that high temperature electrons are essentially important for multicharged-ion production. Multiple-ionization processes are addition-ally introduced to this modelling and quantitatively assessed by using up-to-date cross section data. It is concluded that the multiple ionization has only a small effect on the C. S. D. in the low electron temperature, but a significant effect for the case including high energy component.

• 社団法人日本物理学会の論文
• 1995-01-15

著者

• Kato Yushi

  Department Of Electronics And Informatics Faculty Of Engineering Toyama Prefectural University

• Ishii Shigeyuki

  Department of Electronics and Informatics, Faculty of Engineering, Toyama Prefectural University

• Ishii Shigeyuki

  Department Of Electronics And Informatics Faculty Of Engineering Toyama Prefectural University

関連論文

• Fabrication of Ni/Al2O3/Ni Heteroepitaxial Junction by Post-Hydrogen Reduction of NiO/Al2O3/NiO Trilayered Epitaxial Thin Film
• Fabrication of Ferromagnetic Ni(111) Nanoparticles Embedded Epitaxially in (Mg,Ni)O Matrix by Reduction of (Mg0.5Ni0.5)O(111) Epitaxial Thin Film
• Multiple-Ionization Effect on Charge-State Distribution in ECR Source
• Modelling for Production of Multicharged Ions in ECR Source
• Room-Temperature Epitaxial Growth of (Li,Ni)O Thin Film with Li Content up to 60 mol %

スポンサーリンク