イオン衝撃された銅単結晶(111)の表面形態の研究

概要

論文の詳細を見る
Copper (111) surface bombarded with 5KeV argon ions, was observed by means of an interference microscope and an electron microscope by replica methods. The main results obtained are as follows : 1) The depth sputtered per unit time by bombardment was the largest at first; and the longer the time, the smaller it became, then after 60 minutes it was constant. 2) Etched patterns produced in the crystal by bombardment changed with the time of bombardment; they changed from the fines to the coarses. 3) Etched Patterns varied depending on the orientation of the plane perpendicular to the incident beam. 4) When the fixed target was bombarded with argon ions, its surface was scraped away leaving a pattern like a hole. Etched patterns were coarser in the center of the beam than in the edge of the beam.
山梨大学の論文