Tuning of Barrier Parameters of n-Type Schottky Junctions in Photovoltaic Co-Deposited Films by Doping
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概要
- 論文の詳細を見る
- 2013-01-25
著者
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HIRAMOTO Masahiro
Institute for Molecular Science
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ISHIYAMA Norihiro
Institute for Molecular Science
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KAJI Toshihiko
Institute for Molecular Science
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Yoshioka Tadashi
Institute for Molecular Science, Okazaki, Aichi 444-8787, Japan
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- Tuning of Barrier Parameters of n-Type Schottky Junctions in Photovoltaic Co-Deposited Films by Doping
- Invertible Organic Photovoltaic Cells with Heavily Doped Organic/Metal Ohmic Contacts
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- Tuning of Barrier Parameters of n-Type Schottky Junctions in Photovoltaic Co-Deposited Films by Doping
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