Closed-Form Representations for Third-Order Aberrations of Two-Aspherical Mirror Aplanats with the Mirror Tilt and Decenter

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概要

• 論文の詳細を見る
• 2011-12-01

著者

• Toyoda Mitsunori

  Laboratory Of Soft X-ray Microscopy Institute Of Multidisciplinary Research For Advanced Materials Tohoku University

関連論文

• Observation of Residual-Type Thin Absorber Defect on Extreme Ultraviolet Lithography Mask Using an Extreme Ultraviolet Microscope
• Observation of Residual-Type Thin Absorber Defect on Extreme Ultraviolet Lithography Mask Using an Extreme Ultraviolet Microscope
• Closed-Form Representations for Third-Order Aberrations of Two-Aspherical Mirror Aplanats with the Mirror Tilt and Decenter
• Observation of Residual-Type Thin Absorber Defect on Extreme Ultraviolet Lithography Mask Using an Extreme Ultraviolet Microscope

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