Failure Mechanisms of W/TiN/Ti Metal Lines under High Current Stressing

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概要

• 論文の詳細を見る
• Japan Society of Applied Physicsの論文
• 2012-02-25

著者

• Joo Young-chang

  Department Of Materials Science And Engineering Seoul National University

• Hwang Soo-jung

  National Research Foundation Of Korea

• KIM Deok-kee

  Department of Electrical Engineering, Sejong University

• Kim Deok-kee

  Department Of Electrical Engineering Sejong University

関連論文

• Thermomechanical analysis on the phase stability of nitrogen-doped amorphous Ge2Sb2Te5 films
• Micro-Optical Fiber Coupler on Silicon Bench Based on Microelectromechanical Systems Technology
• Investigation of Similar and Dissimilar Metal Contacts for Reliable Radio Frequency Micorelectromechanical Switches
• Effects of Metal Electrode on the Electrical Performance of Amorphous InGaZnO Thin Film Transistor
• Failure Mechanisms of W/TiN/Ti Metal Lines under High Current Stressing
• Transition of Resistive Switching to Bidirectional Diode in Cu2O/Cu Nanowires
• Erratum: ``Effects of Metal Electrode on the Electrical Performance of Amorphous In--Ga--Zn--O Thin Film Transistor''
• Transition of Resistive Switching to Bidirectional Diode in Cu_2O/Cu Nanowires
• Effect of Nitrogen Implantation with Low Dose on Thermomechanical Properties and Microstructure of Ge2Sb2Te5 Films

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