TEM Characterisation of Silicide Phase Formation in Ni-Based Ohmic Contacts to 4H n-SiC

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概要

• 論文の詳細を見る
• 2011-03-01

著者

• Piotrowska Anna

  Institute Of Electron Technology

• CZERWINSKI Andrzej

  Institute of Electron Technology

• Kuchuk Andrian

  Institute Of Electron Technology

• Katcki Jerzy

  Institute Of Electron Technology

• WZOREK Marek

  Institute of Electron Technology

• RATAJCZAK Jacek

  Institute of Electron Technology

関連論文

• Mesoscopic Phenomena in Microstructures of IV-VI Epilayers
• TEM Characterisation of Silicide Phase Formation in Ni-Based Ohmic Contacts to 4H n-SiC
• PREFACE
• Layer or Strip Resistance Measurement by Electron Beam Induced Current Technique in a Scanning Electron Microscope

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