Development of an Enterprise-Wide Yield Management System Using Critical Area Analysis for High-Product-Mix Semiconductor Manufacturing
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概要
- 論文の詳細を見る
- 2009-01-01
著者
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Tsunoda Yoshiyuki
Renesas Technology Corp.
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Fujita Hiromi
Hitachi High-technologies Corp.
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HAMAMURA Yuichi
Production Engineering Research Laboratory, Hitachi, Ltd.
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MATSUMOTO Chizu
Production Engineering Research Laboratory, Hitachi, Ltd.
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KAMODA Koji
Production Engineering Research Laboratory, Hitachi, Ltd.
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IWATA Yoshio
Renesas Technology Corp.
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KANAMITSU Kenji
Renesas Technology Corp.
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FUJIKI Daisuke
Renesas Technology Corp.
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KOJIKA Fujihiko
Micro Device Division, Hitachi, Ltd.
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NAKAGAWA Yasuo
Research & Development Group
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Kamoda Koji
Production Engineering Research Laboratory Hitachi Ltd.
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Nakagawa Yasuo
Research & Development Group
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Kojika Fujihiko
Micro Device Division Hitachi Ltd.
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Hamamura Yuichi
Production Engineering Research Laboratory Hitachi Ltd.
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Matsumoto Chizu
Production Engineering Research Laboratory Hitachi Ltd.
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Tsunoda Yoshiyuki
Renesas Electronics Corp.
関連論文
- Development of an Enterprise-Wide Yield Management System Using Critical Area Analysis for High-Product-Mix Semiconductor Manufacturing
- Field-Heating Effect-Anomalous Thermomagnetization Curves Observed in Hexagonal LuFe_2O_4
- A New Critical Area Simulation Algorithm and Its Application for Failing Bit Analysis