Magnetic Presheaths in Collisionless and Collisional, Magnetized Plasmas
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概要
- 論文の詳細を見る
- 1995-10-19
著者
関連論文
- Plasma Source Ion Implantation for Ultrashallow Junctions: Low Energy and High Dose Rate
- Characterization of 'Hanbit' ECR plasma by using electric probe system
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- Etching of Multi-Walled Carbon Nanotubes Using Energetic Plasma Ions
- Plasma Source Ion Implantation for Ultrashallow Junctions: Low Energy and High Dose Rate
- Investigation of Current on the Conducting Target Biased with a Large Negative Potential in the Non-Uniform Plasma