Optimum Conditions for De-NOx by Dielectric Barrier Discharge
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概要
- 論文の詳細を見る
- 2002-08-05
著者
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YUKIMURA Ken
Doshisya University
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MARUYAMA Toshiro
Kyoto University
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Nagao Issei
Doshisha University
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YAMAMOTO Kiwamu
Doshisha University
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KAMBARA Shinji
Idemitsu Kosan Co., LTD
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Kambara Shinji
Idemitsu Kosan Co. Ltd
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Yukimura K
Doshisha University
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Yukimura Ken
Doshisha University
関連論文
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- Electrical Characterization of Silicon Dioxide Thin Film Prepared by ArF Excimer Laser Chemical Vapor Deposition frorn Silicon Tetraacetate
- Optimum Conditions for NO Reduction Using Intermittent Dielectric Barrier Discharge at Atmospheric Pressure
- Optimum Conditions for De-NOx by Dielectric Barrier Discharge
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- Ar/O_2 gas pressure dependence of atomic components of zirconia prepared by intermittent zirconium arc PBII&D
- NO_x Removal Using Ammonia Radicals Prepared by Intermittent Dielectric Barrier Discharge at Atmospheric Pressure
- Oxygen influence for efficient DeNOx by direct decomposition of NO using an intermittent DBD generated by one-cycle sinusoidal power source
- Parametric survey for efficient DeNOx by direct decomposition of NO using an intermittent DBD generated by one-cycle sinusoidal power source
- Electrical characteristics of the hybrid plasma of 195kHz-burst RF plasma with arc-free HPPS glow plasma in reactive gases
- NOx Removal Using Ammonia Radicals Prepared by Intermittent Dielectric Barrier Discharge at Atmospheric Pressure