Properties of rf Inductively Coupled SF_6 Plasma Contaminated with Cu Vapor

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概要

• 論文の詳細を見る
• 1998-01-28

著者

• Paul K.

  Faculty Of Engineering Kanazawa University

• SAKUTA T.

  Faculty of Engineering, Kanazawa University

• Sakuta T.

  Faculty Of Engineering Kanazawa University

関連論文

• Effect of SF_6 and N_2 Inclusion on Ar Inductively Coupled Plasma
• Properties of rf Inductively Coupled SF_6 Plasma Contaminated with Cu Vapor

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