Electronic characteristics of charge trapping memory using Al_2O_3 dielectric
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概要
- 論文の詳細を見る
- 2007-09-19
著者
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Kim H.
Dept. Of Electronics Eng. Korea Univ.
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Kim K.
Dept. Of Electronics Eng. Korea Univ.
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Kim T.
Dept. of Mechanical Engineering, Inha University
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SEO Y.
Dept. of Electronics Eng., Korea Univ.
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JOO M.
Advanced Process division, Hynix Semiconductor Inc.
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KIM Y.
Advanced Process division, Hynix Semiconductor Inc.
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PYI S.
Advanced Process division, Hynix Semiconductor Inc.
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CHO H.
Dept. of Physics, Dongguk Univ.
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Pyi S.
Advanced Process Division Hynix Semiconductor Inc.
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Kim Y.
Advanced Process Division Hynix Semiconductor Inc.
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Kim H.
Dept. Of Chemictry Hanyang Univ.
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Seo Y.
Dept. Of Electronics Eng. Korea Univ.
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Kim T.
Dept. Of Electronics Eng. Korea Univ.
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Kim K.
Dept. of Electronics and Computer Eng., Hanyang Univ.
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