Process Induced Damage Analysis of Low-k SiOCH Films Focusing on Siloxane Network and Methyl End Group
スポンサーリンク
概要
- 論文の詳細を見る
- 2007-09-19
著者
-
Ogawa Shinichi
Research Dept. 2 Semiconductor Leading Edge Technologies Inc. (selete)
-
NAKAO Shinichi
Research Dept. 2, Semiconductor Leading Edge Technologies, Inc. (Selete)
-
KINOSHITA Keizo
Research Dept. 2, Semiconductor Leading Edge Technologies, Inc. (Selete)
-
Nakao Shinichi
Research Dept. 2 Semiconductor Leading Edge Technologies Inc. (selete)
-
Kinoshita Keizo
Research Dept. 2 Semiconductor Leading Edge Technologies Inc. (selete)
関連論文
- Process Induced Damage Analysis of Low-k SiOCH Films Focusing on Siloxane Network and Methyl End Group
- Paramagnetic Defect Spin Centers in Porous SiOCH Film Investigated Using Electron Spin Resonance