An Advanced Air Gap Process for MLC flash memories reducing Vth interference and realizing high reliability

スポンサーリンク

概要

• 論文の詳細を見る
• 2006-09-13

著者

• Fukumura T.

  Renesas Technology Corp.

• TSUKAMOTO K.

  Renesas Technology Corp.

• MURATA T.

  Renesas Technology Corp.

• OHTA F.

  Renesas Technology Corp.

• YOSHITAKE T.

  Renesas Technology Corp.

• SHIMIZU S.

  Renesas Technology Corp.

• IKEDA Y.

  Renesas Technology Corp.

• ASAI K.

  Renesas Technology Corp.

• SHIMIZU M.

  Renesas Technology Corp.

• TSUCHIYA O.

  Renesas Technology Corp.

関連論文

• An Advanced Air Gap Process for MLC flash memories reducing Vth interference and realizing high reliability
• Impact of Vth interference suppression using a novel Poly Si shield on FLASH memories
• Three-Dimensional Electro-Thermal Compact Model for Reset Operation of Phase Change Memories

スポンサーリンク