Improving high-κ gate dielectrics properties by high pressure water vapor annealing

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概要

• 論文の詳細を見る
• 2005-09-13

著者

• Sameshima T.

  Tokyo University Of Agriculture And Technology

• Sameshima T.

  Tokyo A&t University

• PUNCHAIPETCH P.

  Nara Institute of Science and Technology

• NAKAMURA H.

  Nara Institute of Science and Technology

• URAOKA Y.

  Nara Institute of Science and Technology

• FUYUKI T.

  Nara Institute of Science and Technology

• HORII S.

  Hitachi Kokusai Electric Inc.

関連論文

• SiO_2 Thin Films Formation by Reactive Evaporation of SiO at a Low Temperature and Its Device Application
• Improving high-κ gate dielectrics properties by high pressure water vapor annealing
• Rapid Thermal Annealing Using the Combustion of H_2 with N_2O
• Does a Low Thermal Budget Help Us? : Crystallization, SiO_2 and TFT

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