Improving high-κ gate dielectrics properties by high pressure water vapor annealing
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概要
- 論文の詳細を見る
- 2005-09-13
著者
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Sameshima T.
Tokyo University Of Agriculture And Technology
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Sameshima T.
Tokyo A&t University
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PUNCHAIPETCH P.
Nara Institute of Science and Technology
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NAKAMURA H.
Nara Institute of Science and Technology
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URAOKA Y.
Nara Institute of Science and Technology
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FUYUKI T.
Nara Institute of Science and Technology
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HORII S.
Hitachi Kokusai Electric Inc.
関連論文
- SiO_2 Thin Films Formation by Reactive Evaporation of SiO at a Low Temperature and Its Device Application
- Improving high-κ gate dielectrics properties by high pressure water vapor annealing
- Rapid Thermal Annealing Using the Combustion of H_2 with N_2O
- Does a Low Thermal Budget Help Us? : Crystallization, SiO_2 and TFT