Rapid Thermal Annealing Using the Combustion of H_2 with N_2O

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概要

• 論文の詳細を見る
• 1996-08-26

著者

• Sameshima T.

  Tokyo A&t University

• TAJIMA A.

  Tokyo A&T University

• TAKASHIMA N.

  Tokyo A&T University

• SUNAGA Y.

  Tokyo A&T University

• Sunaga Y.

  Tokyo A&t University

関連論文

• SiO_2 Thin Films Formation by Reactive Evaporation of SiO at a Low Temperature and Its Device Application
• Improving high-κ gate dielectrics properties by high pressure water vapor annealing
• Rapid Thermal Annealing Using the Combustion of H_2 with N_2O
• Does a Low Thermal Budget Help Us? : Crystallization, SiO_2 and TFT

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