SiO_2 Thin Films Formation by Reactive Evaporation of SiO at a Low Temperature and Its Device Application

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概要

• 論文の詳細を見る
• 1995-08-21

著者

• Sameshima T.

  Tokyo University Of Agriculture & Technology

• Sameshima T.

  Tokyo A&t University

• LANGGUTH G.

  Max-Planck-Institut

関連論文

• SiO_2 Thin Films Formation by Reactive Evaporation of SiO at a Low Temperature and Its Device Application
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• Rapid Thermal Annealing Using the Combustion of H_2 with N_2O
• Does a Low Thermal Budget Help Us? : Crystallization, SiO_2 and TFT

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