MOS Characteristics of NH_3-Nitrided N_2O-Annealed Oxides Fabricated at Reduced Pressure

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概要

• 論文の詳細を見る
• 1999-09-20

著者

• Yoon Giwan

  School Of Eng. Information & Communications University (icu)

• Yoon Giwan

  School Of Engineering Information & Communications University (icu)

• Epstein Yefim

  Intel Massachusetts

関連論文

• On the Construction of High-Rate Quasi-Orthogonal STBC for MIMO QR Demodulation(Communications and Wireless Systems, Recent Advances in Circuits and Systems-Part 1)
• Metal-Oxide-Semiconductor Characteristics of NH_3-Nitrided N_2O-Annealed Oxides Fabricated at Reduced Pressure
• MOS Characteristics of NH_3-Nitrided N_2O-Annealed Oxides Fabricated at Reduced Pressure
• Improved Resonance Characteristics by Thermal Annealing of W/SiO2 Multi-Layers in Film Bulk Acoustic Wave Resonator Devices

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