Pulsed Regime of a Hollow-Cathode Discharge Used in a Sputter Source
スポンサーリンク
概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-10-30
著者
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Luca Dumitru
Faculty Of Physics Alexandru Ioan Cuza University
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APETREI Radu
Faculty of Physics, Alexandru Ioan Cuza University
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ALEXANDROAEI Dumitru
Faculty of Physics, Alexandru Ioan Cuza University
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BALAN Petru
Institute for Ion Physics and Applied Physics, Leopold-Franzens University of Innsbruck
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IONITA Codrina
Institute for Ion Physics and Applied Physics, Leopold-Franzens University of Innsbruck
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SCHRITTWIESER Roman
Institute for Ion Physics and Applied Physics, Leopold-Franzens University of Innsbruck
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POPA Gheorghe
Faculty of Physics, Alexandru Ioan Cuza University
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Schrittwieser Roman
Institute For Ion Physics And Applied Physics Leopold-franzens University Of Innsbruck
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Balan Petru
Institute For Ion Physics And Applied Physics Leopold-franzens University Of Innsbruck
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Apetrei Radu
Faculty Of Physics Alexandru Ioan Cuza University
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Popa Gheorghe
Faculty Of Physics "al.i.cuza" University
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Popa Gheorghe
Faculty Of Physics Alexandru Ioan Cuza University
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Ionita Codrina
Institute For Ion Physics And Applied Physics Leopold-franzens University Of Innsbruck
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Alexandroaei Dumitru
Faculty Of Physics Alexandru Ioan Cuza University
関連論文
- Pulsed Regime of a Hollow-Cathode Discharge Used in a Sputter Source
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- Electron Kinetics of Ionization Waves in Helium Positive Columns
- Nonlinear Dynamics of a Harmonically Forced Double Layer in a Discharge Plasma
- Effects of Nitrogen and Oxygen Radicals on Low-Temperature Bio-Molecule Processing
- Optical Emission Spectroscopy Diagnostic of Discharge Plasma in a Hollow-Cathode Sputtering Source