Dry O_2 High Pressure Field Oxidation for 0.25μm Isolation Technology

スポンサーリンク

概要

• 論文の詳細を見る
• 1995-08-21

著者

• Emami Alan

  Gasonics International

• KIM Sang

  GASONICS International

• Mathews Viju

  Micron Technology Inc.

• Fazan Pierre

  Micron Technology Inc.

• JENG Nanseng

  Micron Technology, Inc.

• Jeng Nanseng

  Micron Technology Inc.

関連論文

• High Pressure High Temperature Steam Oxidation Poly Buffer LOCOS (HP-HTPBL) Field Isolation Process for Reduced Encroachment and Low Stress
• Dry O_2 High Pressure Field Oxidation for 0.25μm Isolation Technology

スポンサーリンク