Electrochemical Analysis for Corrosion Mechanism of Al-Cu Alloy Thin-Films
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概要
- 論文の詳細を見る
- 1995-08-21
著者
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Aoi Nobuo
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
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Mayumi Shuichi
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
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Yano Kousaku
Matsushita Electronics Corporation Kyoto Research Laboratory
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KAWAGUCHI Akemi
Semiconductor Research Center, Matsushita Electric Industrial Co. Ltd.
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Kawaguchi Akemi
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
関連論文
- Novel Porous Films Having Low Dielectric Constants Synthesized by a Liquid Phase Silylation of Spin-On Glass Sol for Intermetal Dielectrics
- Identification of the Particle Source in LSI Manufacturing Process Equipment (Special Issue on Quarter Micron Si Device and Process Technologies)
- Electrochemical Analysis for Corrosion Mechanism of Al-Cu Alloy Thin-Films
- Novel Porous Films Having Low Dielectric Constants Synthesized by Liquid Phase Silylation of Spin-On Glass Sol for Intermetal Dielectrics