Evaluation of Killer Particle Size in Deep Submicron Devices

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概要

• 論文の詳細を見る
• 1996-08-26

著者

• Kitajima Hiroshi

  Ulsi Device Development Laboratories Nec Corporation

• Kitajima Hiroshi

  Ulsi Device Development Laboratory Nec Corporation

• Sasaki Yasushi

  Ulsi Device Development Laboratory Nec Corporation

• KITAJIMA Hiroshi

  ULSI Device Development Division, NEC Corporation

関連論文

• Effect of Metals (Fe,Cu) on 8-nm-Thick Gate Oxide Reliability
• Ultra Shallow Junction Formation with High Process Controllability Using Optimized Rapid Thermal Anneal Process
• Effect of Organic Compounds on Gate Oxide Reliability
• Evaluation of Killer Particle Size in Deep Submicron Devices

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