Deposition and Characterization of Silicon-Germanium Alloy Thin Films on Oxide
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概要
- 論文の詳細を見る
- 1996-08-26
著者
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Reif Rafael
Microsystems Technology Laboratories Mit
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Reif Rafael
Microsystems Technology Laboratories Massachusetts Institute Of Technology
関連論文
- Evaluation of Pentafluoroethane and 1, 1-Difluoroethane for a Dielectric Etch Application in an Inductively Coupled Plasma Etch Tool
- Deposition and Characterization of Silicon-Germanium Alloy Thin Films on Oxide
- Resistivity Study of P-, B-, and BF_2-Implanted Polycrystalline Si_Ge_x Films with Subsequent Annealing