Simple Process for Buried Nanopyramid Array (BNPA) Fabrication by Means of Dopant Ion Implantation and Dual Wet Etching
スポンサーリンク
概要
- 論文の詳細を見る
- 2000-08-28
著者
-
MATSUKAWA T.
Electrotechnical Laboratory
-
GOTO T.
School of Science and Engineering, Waseda University
-
IIDA T.
School of Science and Engineering, Waseda University
-
Tanii T.
School Of Science And Engineering Waseda University
-
Ohdomari I.
Kagami Memorial Laboratory For Materials Science And Technology Waseda University
-
KOH M.
Kagami Memorial Laboratory for Materials Science and Technology, Waseda University
-
SUGITA A.
School of Science and Engineering, Waseda University
-
SHINADA T.
School of Science and Engineering, Waseda University
-
Shinada T.
School Of Science And Engineering Waseda University
-
Koh M.
Kagami Memorial Laboratory For Materials Science And Technology Waseda University
関連論文
- Charging Damage of SOI Wafer Diagnosed by Scanning Maxwell-Stress Microscopy
- 43.1: Invited Paper : Active-Matrix Field-Emitter Arrays for the Next-Generation FEDs(2.主なFED関連発表内容)(Report on 1999 SID International Symposium)
- Simple Fabrication of Silicon Nanopyramids for High Performance Field Emitter Array
- Simple Process for Buried Nanopyramid Array (BNPA) Fabrication by Means of Dopant Ion Implantation and Dual Wet Etching
- Simple Fabrication of Nanopyramid Array (NPA) on Si Surface by Means of Focused Ion Beam Patterning and Wet Etching