Growth of HfSiO_x films by Vapor-Liquid Hybrid Deposition Utilizing Si(OC_2H_5)_4/Hf(^tOC_4H_9)_4 Multilayer Adsorption

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概要

• 論文の詳細を見る
• 2005-12-10

著者

• Yasuda Tetsuji

  Planning Headquarters Aist

• Hojo Daisuke

  Mirai Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Scienc

• XUAN Yi

  MIRAI, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Scie

関連論文

• Growth of HfSiO_x films by Vapor-Liquid Hybrid Deposition Utilizing Si(OC_2H_5)_4/Hf(^tOC_4H_9)_4 Multilayer Adsorption
• Growth of HfSiOx films by Vapor–Liquid Hybrid Deposition Utilizing Si(OC2H5)4/Hf(tOC4H9)4 Multilayer Adsorption

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