Plasma Immersion Ion Implantation for Shallow Junctions and Other Applications
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概要
- 論文の詳細を見る
- 1997-06-05
著者
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YANG B.
Department of Prosthodontics, Propaedeutics and Dental Materials, Christian-Albrechts University at
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Chan C.
Department Of Applied Biology And Chemical Technology Hong Kong Polytechnic University
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Denholm S.
Eaton Corporation Semiconductor Equipment Operations
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Sinclair F.
Eaton Corporation Semiconductor Equipment Operations
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Cheung N.
Department Of Electrical Engineering And Computer Sciences University Of California
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SHAO J.
Eaton Corporation, Semiconductor Equipment Operations
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JONES E.
Ion Beam Engineering Experimental Laboratory, Kyoto University
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QIN S.
Department of Electrical and Computer Engineering, Northeastern University
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TAKEI S.
Sumitoma Eaton Nova Corporation
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Jones E.
Ion Beam Engineering Experimental Laboratory Kyoto University
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Yang B.
Department Of Physiology College Of Dentistry And Dental Research Institute Seoul National University
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