Full-Chip Implementation of IDEALSmile on 90-nm-Node Devices by ArF Lithography

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2005-07-30

著者

• Lupo Marco

  Stmicroelectronics

• Hasegawa Yasuo

  Canon Inc.

• Suzuki Akiyoshi

  Optics Technology Research Center Canon Inc.

• YAMAZOE Kenji

  Canon Inc.

• CANTU Pietro

  STMicroelectronics

• CAPETTI Gianfranco

  STMicroelectronics

• EVANGELISTA Elena

  STMicroelectronics

• IWASA Junji

  Canon Italy

• TOUBLAN Olivier

  Mentor Graphics Europe

• LOI Sara

  STMicroelectronics

• PEPE Annalisa

  STMicroelectronics

• KUNO Toshihisa

  Canon Inc.

• SUZUKI Akiyoshi

  Canon Inc.

• SAITOH Kenji

  Canon Inc.

関連論文

• Full-Chip Implementation of IDEALSmile on 90-nm-Node Devices by ArF Lithography
• An Innovative Method for Contact Hole Printing with Binary Mask and Single Exposure
• An Innovative Method for Contact Hole Printing with Binary Mask and Single Exposure

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