An Innovative Method for Contact Hole Printing with Binary Mask and Single Exposure

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2004-06-30

著者

• Saitoh Kenji

  Optics Technology Research Center Canon Inc.

• Suzuki Akiyoshi

  Optics Technology Research Center Canon Inc.

• YAMAZOE Kenji

  Optics Technology Research Center, Canon Inc.

関連論文

• Full-Chip Implementation of IDEALSmile on 90-nm-Node Devices by ArF Lithography
• An Innovative Method for Contact Hole Printing with Binary Mask and Single Exposure
• An Innovative Method for Contact Hole Printing with Binary Mask and Single Exposure

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