Fluoride Resonant Tunneling Diodes Co-Integrated with Si-MOSFETs
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概要
- 論文の詳細を見る
- 2001-09-25
著者
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Sekine Hisashi
Interdisciplinary Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Sekine Hiroshi
Tokyo Research Institute Of Yawata Iron And Steel Co. Ltd.
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Tsutsui Kazuo
Tokyo Institute Of Technology Interdisciplinary Graduate School Of Science & Engineering
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Terayama Toshiaki
Interdisciplinary Graduate School Of Science And Engineering Tokyo Institute Of Technology
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TERAYAMA Toshiaki
Tokyo Institute of Technology, Interdisciplinary Graduate School of Science & Engineering
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KAMBAYASHI Hiroshi
Tokyo Institute of Technology, Interdisciplinary Graduate School of Science & Engineering
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Kambayashi Hiroshi
Tokyo Institute Of Technology Interdisciplinary Graduate School Of Science & Engineering
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Sekine Hiroshi
Interdisciplinary Graduate School Of Science And Engineering Tokyo Institute Of Technology
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- Fluoride Resonant Tunneling Diodes Co-Integrated with Si-MOSFETs
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