Periodic Mesoporous Silicate Glass as Low-k Thin Film
スポンサーリンク
概要
- 論文の詳細を見る
- 2001-09-25
著者
-
Oku Yoshiaki
Process Technology Div. Semiconductor Research And Development Headquarters Rohm Co. Ltd.
-
Nishiyama Norikazu
Osaka University Graduate School Of Engineering Science
-
Kamisawa Akira
Process Technology Div. Semiconductor Research And Development Headquarters Rohm Co. Ltd.
-
Ueyama Korekazu
Osaka University Graduate School Of Engineering Science
関連論文
- Properties of Ferroelectric Memory FET Using Sr_2(Ta,Nb)_2O_7 Thin Film
- Application of Sr_2Nb_2O_7 Family Ferroelectric Films for Ferroelectric Memory Field Effect Transistor
- Properties of Ferroelectric Memory FET Using Sr_2(Ta,Nb)_2O_7 Thin Film
- Periodic Mesoporous Silicate Glass as Low-k Thin Film