Fractal Roughness of Polymers after Lithographic Processing

概要

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The morphology of photoresist polymer surfaces fabricated by lithographic processes is shown to exhibit self-affine behavior for a specific range of scales. The roughness parameters appropriate for the characterization of self-affine surfaces (surface width $w$, correlation length $\xi$ and roughness exponent $\alpha$) are found to depend on the exposure dose (i.e. the solubility) involved in the lithography process and to be correlated. A similar dependence and correlation is extracted from a Monte-Carlo simulation of polymer dissolution, thus indicating the pronounced contribution of the dissolution process to the formation of lithographic roughness. The self-affinity and the correlated behavior of the roughness parameters is a general phenomenon for dissolving polymers of varying solubility and not limited to the lithographic process.
Japan Society of Applied Physicsの論文
2005-01-10