Development of a Sub-micron Processing Method with Ion Implantation

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概要

• 論文の詳細を見る

• We have developed a precise sub-μm processing method by combining ion implantation and nano-plating. In order to show the applicability of this method, we have fabricated a mask for a Bragg grating, which has a striped gold structure with a height of 1.2 μm and a period of 1.59 μm on a 2-μm thick SiN membrane. We have also confirmed that the mask pattern can be transferred inside a silica glass by ion implantation. It is expected that this result can be utilized for the fabrication of optical communication devices.

• 社団法人 電気学会の論文
• 2005-01-01

著者

• SAITO Mikiko

  Waseda University

• Yu Seung

  Dept. Of Electrical Engineering And Bioscience Waseda University

• Wada Yasuo

  Waseda Univ. Graduate School Of Science And Engineering

• Saito Mikiko

  Waseda University Nanotechnology Research Institute

• Ohkubo Hideaki

  Dept. Of Electrical Engineering And Bioscience Waseda University

• FUJIMAKI Makoto

  Dept. of Electrical Engineering and Bioscience, Waseda University

• KAWABE Keita

  Dept. of Electrical Engineering and Bioscience, Waseda University

• HATTORI Masaharu

  KDDI R&D Laboratories Inc.

• OHKI Yoshimichi

  Dept. of Electrical Engineering and Bioscience, Waseda University

• Kawabe Keita

  Dept. Of Electrical Engineering And Bioscience Waseda University

• Hattori Masaharu

  Kddi R&d Laboratories Inc.

• Fujimaki Makoto

  Dept. Of Electrical Engineering And Bioscience Waseda University

• Ohki Yoshimichi

  Dept. Of Electrical Engineering And Bioscience Waseda University

• Wada Yasuo

  Waseda University Nanotechnology Research Institute

関連論文

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