Characteristics of O(^3P) Density in O_2 and Kr Gas Mixture Remote Plasma Oxidation of Silicon Measured by Two-Photon Absorption Laser-Induced Fluorescence
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概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2003-12-01
著者
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Kurihara K
Aset Kanagawa Jpn
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KAMIOKA Isao
Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation
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KURIHARA Kazuaki
Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation
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Kamioka Isao
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Kurihara Kazuaki
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation