Kurihara Kazuaki | Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation

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概要

関連著者

Kurihara K
Aset Kanagawa Jpn
KAMIOKA Isao
Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation
KURIHARA Kazuaki
Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation
Kamioka Isao
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
Kurihara Kazuaki
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation

著作論文

Characteristics of O(^3P) Density in O_2 and Kr Gas Mixture Remote Plasma Oxidation of Silicon Measured by Two-Photon Absorption Laser-Induced Fluorescence

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