Quantitative Analysis of CF_4 Produced in the SiO_2 Etching Process Using c-C_4F_8, C_3F_8, and C_2F_6 Plasmas by In Situ Mass Spectrometry
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-01-15
著者
-
Furuya Kenji
Department Of Molecular And Material Sciences Kyushu University
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Hatano Yoshihiko
Department Of Molecular And Material Sciences Kyushu University
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