QUANTITATIVE ANALYSIS OF CF_4 PRODUCED IN THE SiO_2 ETCHING PROCESS BY c-C_4F_8, C_3F_8, AND C_2F_6 PLASMAS USING IN-SITU MASS SPECTROMETRY
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概要
- 論文の詳細を見る
- 2003-12-15
著者
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Furuya Kenji
Department Of Molecular And Material Sciences Kyushu University
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Hatano Yoshihiko
Department Of Molecular And Material Sciences Kyushu University
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Hatano Yoshihiko
Department Of Chemistry Tokyo Institute Of Technology
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